Fabrication of Copper and Iron Nano/Micro Structures on Semiconducting Substrate and Their Electrical Characterization

Document Type: Research Paper


1 Department of Physics, Guru Nanak Dev University, Amritsar, India

2 Department of Physics, Haryana College of Technology and Management, Kaithal, India

3 IUAC New Delhi, India

4 Manav Rachna International University(MRIU),Faridabad, India


In this paper, we have studied the electrical properties of the randomly distributed metallic (Co and Fe) nano/ micro wires on Silicon substrate. Deposition was carried out potentiostatically into the pores of the track-etch polycarbonate membrane spin coated onto the Si substrate. Spin coated films were irradiated with 150MeV Ni (+11) ions at a fluence of 8E7 ions/cm2, followed by UV irradiation and chemically etching in aqueous NaOH (6N, at room temperature). The size, shape and morphology of the synthesized nano/micro structures is strongly dependent on the preparation conditions such as deposition potential, current density, electrolyte and etching conditions. Later, morphological and electrical properties of the so deposited nano-/micro structureswere studied.