%0 Journal Article %T Fabrication of Copper and Iron Nano/Micro Structures on Semiconducting Substrate and Their Electrical Characterization %J International Journal of Nanoscience and Nanotechnology %I Iranian Nanotechnology Society %Z 1735-7004 %A Kaur, J. %A Singh, S. %A Kumar, R. %A Kanjilal, D. %A Chakarvarti, Sh. %D 2011 %\ 12/01/2011 %V 7 %N 4 %P 183-189 %! Fabrication of Copper and Iron Nano/Micro Structures on Semiconducting Substrate and Their Electrical Characterization %K Irradiation %K Ion track %K etching %R %X In this paper, we have studied the electrical properties of the randomly distributed metallic (Co and Fe) nano/ micro wires on Silicon substrate. Deposition was carried out potentiostatically into the pores of the track-etch polycarbonate membrane spin coated onto the Si substrate. Spin coated films were irradiated with 150MeV Ni (+11) ions at a fluence of 8E7 ions/cm2, followed by UV irradiation and chemically etching in aqueous NaOH (6N, at room temperature). The size, shape and morphology of the synthesized nano/micro structures is strongly dependent on the preparation conditions such as deposition potential, current density, electrolyte and etching conditions. Later, morphological and electrical properties of the so deposited nano-/micro structureswere studied. %U https://www.ijnnonline.net/article_3930_d7c6e6cbc36d6c767b6604b5fd78430d.pdf