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<Journal>
				<PublisherName>Iranian Nanotechnology Society</PublisherName>
				<JournalTitle>International Journal of Nanoscience and Nanotechnology</JournalTitle>
				<Issn>1735-7004</Issn>
				<Volume>7</Volume>
				<Issue>4</Issue>
				<PubDate PubStatus="epublish">
					<Year>2011</Year>
					<Month>12</Month>
					<Day>01</Day>
				</PubDate>
			</Journal>
<ArticleTitle>Fabrication of Copper and Iron Nano/Micro Structures on Semiconducting Substrate and Their Electrical Characterization</ArticleTitle>
<VernacularTitle></VernacularTitle>
			<FirstPage>183</FirstPage>
			<LastPage>189</LastPage>
			<ELocationID EIdType="pii">3930</ELocationID>
			
			
			<Language>EN</Language>
<AuthorList>
<Author>
					<FirstName>J.</FirstName>
					<LastName>Kaur</LastName>
<Affiliation>Department of Physics, Guru Nanak Dev University, Amritsar, India</Affiliation>

</Author>
<Author>
					<FirstName>S.</FirstName>
					<LastName>Singh</LastName>
<Affiliation>Department of Physics, Guru Nanak Dev University, Amritsar, India</Affiliation>

</Author>
<Author>
					<FirstName>R.</FirstName>
					<LastName>Kumar</LastName>
<Affiliation>Department of Physics, Haryana College of Technology and Management, Kaithal, India</Affiliation>

</Author>
<Author>
					<FirstName>D.</FirstName>
					<LastName>Kanjilal</LastName>
<Affiliation>IUAC New Delhi, India</Affiliation>

</Author>
<Author>
					<FirstName>Sh.</FirstName>
					<LastName>Chakarvarti</LastName>
<Affiliation>Manav Rachna International University(MRIU),Faridabad, India</Affiliation>

</Author>
</AuthorList>
				<PublicationType>Journal Article</PublicationType>
			<History>
				<PubDate PubStatus="received">
					<Year>2011</Year>
					<Month>09</Month>
					<Day>10</Day>
				</PubDate>
			</History>
		<Abstract>In this paper, we have studied the electrical properties of the randomly distributed metallic (Co and Fe) nano/ micro wires on Silicon substrate. Deposition was carried out potentiostatically into the pores of the track-etch polycarbonate membrane spin coated onto the Si substrate. Spin coated films were irradiated with 150MeV Ni (+11) ions at a fluence of 8E7 ions/cm2, followed by UV irradiation and chemically etching in aqueous NaOH (6N, at room temperature). The size, shape and morphology of the synthesized nano/micro structures is strongly dependent on the preparation conditions such as deposition potential, current density, electrolyte and etching conditions. Later, morphological and electrical properties of the so deposited nano-/micro structureswere studied.</Abstract>
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			<Param Name="value">Irradiation</Param>
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			<Object Type="keyword">
			<Param Name="value">Ion track</Param>
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			<Object Type="keyword">
			<Param Name="value">etching</Param>
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<ArchiveCopySource DocType="pdf">https://www.ijnnonline.net/article_3930_679d8bbd776e0bbf3b044306c5be94ae.pdf</ArchiveCopySource>
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